Lam Research Unveils Technology Breakthrough for EUV Lithography
FREMONT, Calif., Feb. 27, 2020 /PRNewswire-AsiaNet/ -- New dry resist technology being developed with ASML and imec will help to extend EUV lithography's resolution, productivity and yieldLam Research Corp. (Nasdaq: LRCX) today announced a dry resist technology for extreme ultraviolet (EUV) patter...
Authors: LATEST ASIANET NEWS RELEASES